HTTF-1200 HPCVD furnace is a compact split tube furnace with an internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller. This vacuum tube furnace is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth (HDC) under various atmospheres for new-generation crystal research.
Split Tube Furnace | 208 - 240 VAC, 50/60Hz, 1.2 KW max. power consumption Working temperature: 1100°C continuous and 1200°C Max. 2" quartz tube (50mm O.D x 44mm I.D x 450mm L) with vacuum-sealed flanges. Optional: you may choose a dual-zone tube furnace at Pic below right at extra cost to create a higher thermal gradient or longer constant temperature zone | ||
Temperature Control | PID automatic control via solid-state relay with 30 steps programmable Built-in Over Temperature and Thermocouple Failure Protection +/-1°C accuracy K-type thermal couple Heating zone Length: 200mm Constant temperature zone: 60 mm (+/-1°C @ 1000 °C ) | ||
Vacuum Sealing | 2" quick clamp flange with 1/4'' fittings, vacuum gauge as well as needle valve on the right side The right flange is connected to a stainless steel bellow which is stretchable up to 150 mm. Left flange with quick-clamped KF25 vacuum port and 1/4'' barb venting valve Max. Vacuum level: 10E-2 torr by mechanical pump and 10-E5 by turbopump | ||
Internal Traveling Mechanism & PLC Control Panel | One 1/4" Dia. x 24'' long K-type thermal couple is inserted through the right flange to support a mini-crucible boat in the chamber. (click pic.1 to view) A step motor (24VDC, 100W) drives the crucible inside the tube from the heating center to the right end of the furnace, L100 mm max. with air-tight Touch screen panel allows control of travel distance and temperature display of crucible position Traveling speed is constant at 180mm/ min. (variable speed control is available upon request at additional cost) A 50x20x20mm mini-crucible boat (~20ml) is installed on a thermal couple (click pic.3 to view). AIN Sample Holder or Graphite Flat Substrate Holder for the wafer is available upon request, additional customization fee will apply. | ||
Max. Heating & Cooling Rate | The max heating and cooling rate can be achieved by moving the sample into the pre-heated hot zone and moving the sample out from the hot zone. The typical ramp/cool rate is listed in below:
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Optional Parts | You may need a right-angle valve & bellows to connect a vacuum pump (click the 1st & 2nd pics to order) Anti-Corrosive digital Gauge up to 10E-5 torr is optional for CVD application You may order a multi-channel gas delivery system for DVD or CVD operation | ||
Warranty | One-year limited warranty with lifetime support (Consumable parts such as tubes and o-rings are not covered by the warranty) | ||
Laptop, software (Optional) | Brand new laptop with Microsoft Windows 10 and Microsoft Office 2013 (30 days free trial) for immediate use. Labview-Based Temperature Control System enables users to edit temperature profiles, manage heat-treatment recipes, and record and plot data for MTI furnaces. | ||
Warning | Tube furnaces with quartz tubes are designed for use under vacuum and low pressure < 0.2 bars / 3 psi Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C | ||
Application Notes | This multi-functional furnace is suitable for the applications in below: RTE: Crucible loaded with evaporation material is placed in the center of the furnace, and moves sample holder to a downstream position with the appropriate temperature where the deposition takes place. HPCVD： Similar setup as RTE, we also introduce reactant gas to mix with evaporation vapor and make a deposition Horizontal Bridgman Crystal Growth： Load material and seed into a crucible and place it in the center of the furnace. Move the crucible at the desired speed to grow a single crystal under a suitable thermal gradient. If you have any questions or suggestions, please contact us before purchasing After CVD, the graphene must be transferred from the metal catalyst to another substrate for most applications. By using the graphene transfer tape, the residue can be low For Horizontal directional crystalization (HDC), you may use a gas feedthrough as in the pic additional. |
HTTF-1200 HPCVD furnace is a compact split tube furnace with an internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller. This vacuum tube furnace is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth (HDC) under various atmospheres for new-generation crystal research.
Split Tube Furnace | 208 - 240 VAC, 50/60Hz, 1.2 KW max. power consumption Working temperature: 1100°C continuous and 1200°C Max. 2" quartz tube (50mm O.D x 44mm I.D x 450mm L) with vacuum-sealed flanges. Optional: you may choose a dual-zone tube furnace at Pic below right at extra cost to create a higher thermal gradient or longer constant temperature zone | ||
Temperature Control | PID automatic control via solid-state relay with 30 steps programmable Built-in Over Temperature and Thermocouple Failure Protection +/-1°C accuracy K-type thermal couple Heating zone Length: 200mm Constant temperature zone: 60 mm (+/-1°C @ 1000 °C ) | ||
Vacuum Sealing | 2" quick clamp flange with 1/4'' fittings, vacuum gauge as well as needle valve on the right side The right flange is connected to a stainless steel bellow which is stretchable up to 150 mm. Left flange with quick-clamped KF25 vacuum port and 1/4'' barb venting valve Max. Vacuum level: 10E-2 torr by mechanical pump and 10-E5 by turbopump | ||
Internal Traveling Mechanism & PLC Control Panel | One 1/4" Dia. x 24'' long K-type thermal couple is inserted through the right flange to support a mini-crucible boat in the chamber. (click pic.1 to view) A step motor (24VDC, 100W) drives the crucible inside the tube from the heating center to the right end of the furnace, L100 mm max. with air-tight Touch screen panel allows control of travel distance and temperature display of crucible position Traveling speed is constant at 180mm/ min. (variable speed control is available upon request at additional cost) A 50x20x20mm mini-crucible boat (~20ml) is installed on a thermal couple (click pic.3 to view). AIN Sample Holder or Graphite Flat Substrate Holder for the wafer is available upon request, additional customization fee will apply. | ||
Max. Heating & Cooling Rate | The max heating and cooling rate can be achieved by moving the sample into the pre-heated hot zone and moving the sample out from the hot zone. The typical ramp/cool rate is listed in below:
| ||
Optional Parts | You may need a right-angle valve & bellows to connect a vacuum pump (click the 1st & 2nd pics to order) Anti-Corrosive digital Gauge up to 10E-5 torr is optional for CVD application You may order a multi-channel gas delivery system for DVD or CVD operation | ||
Warranty | One-year limited warranty with lifetime support (Consumable parts such as tubes and o-rings are not covered by the warranty) | ||
Laptop, software (Optional) | Brand new laptop with Microsoft Windows 10 and Microsoft Office 2013 (30 days free trial) for immediate use. Labview-Based Temperature Control System enables users to edit temperature profiles, manage heat-treatment recipes, and record and plot data for MTI furnaces. | ||
Warning | Tube furnaces with quartz tubes are designed for use under vacuum and low pressure < 0.2 bars / 3 psi Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C | ||
Application Notes | This multi-functional furnace is suitable for the applications in below: RTE: Crucible loaded with evaporation material is placed in the center of the furnace, and moves sample holder to a downstream position with the appropriate temperature where the deposition takes place. HPCVD： Similar setup as RTE, we also introduce reactant gas to mix with evaporation vapor and make a deposition Horizontal Bridgman Crystal Growth： Load material and seed into a crucible and place it in the center of the furnace. Move the crucible at the desired speed to grow a single crystal under a suitable thermal gradient. If you have any questions or suggestions, please contact us before purchasing After CVD, the graphene must be transferred from the metal catalyst to another substrate for most applications. By using the graphene transfer tape, the residue can be low For Horizontal directional crystalization (HDC), you may use a gas feedthrough as in the pic additional. |
