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PECVD Split Tube Furnace with 4 Channels Gas Delivery
  • PECVD Split Tube Furnace with 4 Channels Gas Delivery
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PECVD Split Tube Furnace with 4 Channels Gas Delivery

PECVD Split Tube Furnace with 4 Channels Gas Delivery is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) laboratory vacuum tube furnace system, The PECVD tube furnace is an ideal and affordable tool (laboratory tube furnace) to deposit thin films or grow nanowire from a gas state (vapor) to a solid state, and benefits.

HTTF-1200-PE PECVD Split Tube Furnace with 4 Channels Gas Delivery is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) laboratory vacuum tube furnace system, which consists of 300W RF plasma source, 2"  or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump. The PECVD furnace is an ideal and affordable tool (laboratory tube furnace) to deposit thin films or grow nanowire from a gas state (vapor) to a solid state, and benefits:

Lower temperature processing compared to conventional CVD high temperature vacuum tube furnace.

Film stress can be controlled by high/low frequency mixing techniques.

Control over stoichiometry via process conditions.

Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

 

STANDARD SPECIFICATION of PECVD Split Tube Furnace

Split Tube furnace

1200oC Max. working temperature for <   60 minutes

1100oC Max for continuous heating

30 segments programmable precision   digital temperature controller

440 mm length single heating zone and 150   mm length constant temperate zone

High purity quartz tube optional from (   click optional bar to choose )

One pair of vacuum sealed flange with   valves

2"OD x 1.7"ID x  48" Length

3.14"OD x 2.83"ID x 48'' Length

Input power: 208 – 240V AC input, single   phase at max. 4KW

Plasma RF Power Supply of high   temperature furnace

Output Power:    5 -300W adjustable with ± 1% stability

RF frequency:     13.56 MHz ±0.005% stability

Reflection Power:  200W max.

Matching:        Automatic

RF Output Port:    50 Ω, N-type, female

Noise:            <50 dB.

Cooling:           Air cooling.

Power:            208-240VAC, 50/60Hz

Note:             This RF power supply can accept   50 - 80 mm Max. quartz tube  by   changing flange

Anti-corrosive Pressure Gauge of PECVD   Split tube furnace

3.8x10-5 to 1125 Torr measurement range

Anti-corrosive, gas-type independent

High accuracy and reproducibility at   atmosphere for reliable atmospheric pressure detection

Fast atmospheric detection eliminates   waiting time and shortens process cycle

Easy to exchange plug & play sensor   element

Vacuum Pump and valve of high temperature   furnace

Heavy Duty Rotary Vane Vacuum Pump (7.8   CFM -240 L/m) with Two Stage Exhaust System installed in the bottom case with   max. vacuum pressure 10-2 torr.

 KFD25 adapter and stainless steel pipe are   connected between pump and tube flange with precision ball valve

 Digital vacuum pressure gauge and display   are installed with the furnace

Option: For precise control of the vacuum   pressure, we recommend you choose our turn-key solution EQ-VPC-MV. This is a   vacuum pressure regulating system with motorized valve and gauge. It controls   pressure range from 10^-6 torr ~ 760 torrs.

Mass Flowmeter of CVD tube furnace

4-Channelled Gas Mixing

Made of 316 stainless steel valve

Gas mixing tank: Φ80X120mm 

600mm(L) x 745mm(W) x 700mm(H)

6" color touch screen control panel   to make parameter setting at easy.

Touchscreen Control and PC remote   switchable.

23W per channel

 AC   220V/50Hz Single phase

Temperature Controller of PECVD Laboratory   tube furnace

30 programmable segments for precise   control of heating rate, cooling rate and dwell time.

Built in PID Auto-Tune function with   overheating & broken thermocouple protection for laboratory tube furnace.

Over temperature protection and alarm   allows for operation without attendant(s).

+/- 1 ºC temperature accuracy of vacuum   tube furnace.

RS485 Communications Port.

Advanced Temperature Control (Optional)

MTS02-Y Temperature control software kit   (for YD518P series controllers) + 15" laptop package is available at the   options bar. Click for the detail information about the MTS02-Y software kit.  

You may upgrade the temperature   controller to the Eurotherm 3204 Temperature Controller which is fully   compatible with LabVIEW. This package includes a Eurotherm 3204 programmer, a   communication cable (RS485 - USB) and a software CD. Click the pic below to   view the full spec of Eurotherm 3204 temperature controller.

Warning of split tube furnace

The PECVD Split tube furnace with quartz   tube are designed for using under vacuum and low pressure < 0.2 bars / 3   psi / 0.02 Mpa

Attention: A two-stage pressure regulator   must be installed on the gas cylinder to limit the pressure to below 3 PSI for   safe operation. Click here to learn the installation of a gas regulator.

Vacuum limit definition for all quartz   tube furnaces: * Vacuum pressures may only be safely used up to 1000°C

The flow rate for gasses should be   limited to<200 SCCM (or 200ml/min) for reducing thermal shocks to the tube

HT reserves right to modify PECVD design   at  any time without notice but promise   that quality will meet the specifications above

Warranty of PECVD tube furnace

One year limited warranty with lift time   support (Consumable parts such as processing tubes, O-rings, and heating   elements are not covered by the warranty, please order the replacement at   related products below.)


HTTF-1200-PE PECVD Split Tube Furnace with 4 Channels Gas Delivery is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) laboratory vacuum tube furnace system, which consists of 300W RF plasma source, 2"  or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump. The PECVD furnace is an ideal and affordable tool (laboratory tube furnace) to deposit thin films or grow nanowire from a gas state (vapor) to a solid state, and benefits:

Lower temperature processing compared to conventional CVD high temperature vacuum tube furnace.

Film stress can be controlled by high/low frequency mixing techniques.

Control over stoichiometry via process conditions.

Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

 

STANDARD SPECIFICATION of PECVD Split Tube Furnace

Split Tube furnace

1200oC Max. working temperature for <   60 minutes

1100oC Max for continuous heating

30 segments programmable precision   digital temperature controller

440 mm length single heating zone and 150   mm length constant temperate zone

High purity quartz tube optional from (   click optional bar to choose )

One pair of vacuum sealed flange with   valves

2"OD x 1.7"ID x  48" Length

3.14"OD x 2.83"ID x 48'' Length

Input power: 208 – 240V AC input, single   phase at max. 4KW

Plasma RF Power Supply of high   temperature furnace

Output Power:    5 -300W adjustable with ± 1% stability

RF frequency:     13.56 MHz ±0.005% stability

Reflection Power:  200W max.

Matching:        Automatic

RF Output Port:    50 Ω, N-type, female

Noise:            <50 dB.

Cooling:           Air cooling.

Power:            208-240VAC, 50/60Hz

Note:             This RF power supply can accept   50 - 80 mm Max. quartz tube  by   changing flange

Anti-corrosive Pressure Gauge of PECVD   Split tube furnace

3.8x10-5 to 1125 Torr measurement range

Anti-corrosive, gas-type independent

High accuracy and reproducibility at   atmosphere for reliable atmospheric pressure detection

Fast atmospheric detection eliminates   waiting time and shortens process cycle

Easy to exchange plug & play sensor   element

Vacuum Pump and valve of high temperature   furnace

Heavy Duty Rotary Vane Vacuum Pump (7.8   CFM -240 L/m) with Two Stage Exhaust System installed in the bottom case with   max. vacuum pressure 10-2 torr.

 KFD25 adapter and stainless steel pipe are   connected between pump and tube flange with precision ball valve

 Digital vacuum pressure gauge and display   are installed with the furnace

Option: For precise control of the vacuum   pressure, we recommend you choose our turn-key solution EQ-VPC-MV. This is a   vacuum pressure regulating system with motorized valve and gauge. It controls   pressure range from 10^-6 torr ~ 760 torrs.

Mass Flowmeter of CVD tube furnace

4-Channelled Gas Mixing

Made of 316 stainless steel valve

Gas mixing tank: Φ80X120mm 

600mm(L) x 745mm(W) x 700mm(H)

6" color touch screen control panel   to make parameter setting at easy.

Touchscreen Control and PC remote   switchable.

23W per channel

 AC   220V/50Hz Single phase

Temperature Controller of PECVD Laboratory   tube furnace

30 programmable segments for precise   control of heating rate, cooling rate and dwell time.

Built in PID Auto-Tune function with   overheating & broken thermocouple protection for laboratory tube furnace.

Over temperature protection and alarm   allows for operation without attendant(s).

+/- 1 ºC temperature accuracy of vacuum   tube furnace.

RS485 Communications Port.

Advanced Temperature Control (Optional)

MTS02-Y Temperature control software kit   (for YD518P series controllers) + 15" laptop package is available at the   options bar. Click for the detail information about the MTS02-Y software kit.  

You may upgrade the temperature   controller to the Eurotherm 3204 Temperature Controller which is fully   compatible with LabVIEW. This package includes a Eurotherm 3204 programmer, a   communication cable (RS485 - USB) and a software CD. Click the pic below to   view the full spec of Eurotherm 3204 temperature controller.

Warning of split tube furnace

The PECVD Split tube furnace with quartz   tube are designed for using under vacuum and low pressure < 0.2 bars / 3   psi / 0.02 Mpa

Attention: A two-stage pressure regulator   must be installed on the gas cylinder to limit the pressure to below 3 PSI for   safe operation. Click here to learn the installation of a gas regulator.

Vacuum limit definition for all quartz   tube furnaces: * Vacuum pressures may only be safely used up to 1000°C

The flow rate for gasses should be   limited to<200 SCCM (or 200ml/min) for reducing thermal shocks to the tube

HT reserves right to modify PECVD design   at  any time without notice but promise   that quality will meet the specifications above

Warranty of PECVD tube furnace

One year limited warranty with lift time   support (Consumable parts such as processing tubes, O-rings, and heating   elements are not covered by the warranty, please order the replacement at   related products below.)