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High heating rate Rapid Thermal Process Ovens with 200K/sec Ramp up Rate
  • High heating rate Rapid Thermal Process Ovens with 200K/sec Ramp up Rate
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High heating rate Rapid Thermal Process Ovens with 200K/sec Ramp up Rate

The Rapid Thermal Process Ovens (RTP) has a heating rate of 200K/sec and is a device that can achieve rapid sample heating and precise temperature control in a very short period of time. This high-speed heating capability gives it significant advantages in fields such as semiconductor manufacturing and material research, greatly reducing process time, minimizing thermal budget, reducing thermal damage to materials, and improving production efficiency and product performance.

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  • Product Details
  • The Rapid Thermal Process Ovens (RTP) has a heating rate of 200K/sec and is a device that can achieve rapid sample heating and precise temperature control in a very short period of time. This high-speed heating capability gives it significant advantages in fields such as semiconductor manufacturing and material research, greatly reducing process time, minimizing thermal budget, reducing thermal damage to materials, and improving production efficiency and product performance.

     

    Specifications

    Type

    RTP 100

    RTP 150

    Max temperature

    1000

    1200

    Vacuum capable

    Up to 10-3 hPa

    Chamber material

    Aluminium chamber and quartz glass universal holder

    Process Chamber

    Quartz glass chamber

    Chamber height

    18mm

    Vacuum capacity

    Up to 10-3hpa,RTP-100-HV up to 10-6hpa

    Temperature max.

    1200

    Heating

    Top and bottom heating with 18 IR Lamps(20KW)

    Chamber cooling

    Water cooled

    Substrate Cooling

    By nitrogen gas

    Process chamber

    134*169*18mm(W*D*H)

    Electric connection

    400/230V,20kw

    Weight

    55kg

    Flow controller

    Mass flow controller

    Max Past size

    100mm dia.(4’’)

     

    Features

    1. Excellent temperature uniformity up to 4 gas lines

    2. Heated by 2×24 IR infrared Lamps

    3. Flow controller for 5nlmvacuum

     


    The Rapid Thermal Process Ovens (RTP) has a heating rate of 200K/sec and is a device that can achieve rapid sample heating and precise temperature control in a very short period of time. This high-speed heating capability gives it significant advantages in fields such as semiconductor manufacturing and material research, greatly reducing process time, minimizing thermal budget, reducing thermal damage to materials, and improving production efficiency and product performance.

     

    Specifications

    Type

    RTP 100

    RTP 150

    Max temperature

    1000

    1200

    Vacuum capable

    Up to 10-3 hPa

    Chamber material

    Aluminium chamber and quartz glass universal holder

    Process Chamber

    Quartz glass chamber

    Chamber height

    18mm

    Vacuum capacity

    Up to 10-3hpa,RTP-100-HV up to 10-6hpa

    Temperature max.

    1200

    Heating

    Top and bottom heating with 18 IR Lamps(20KW)

    Chamber cooling

    Water cooled

    Substrate Cooling

    By nitrogen gas

    Process chamber

    134*169*18mm(W*D*H)

    Electric connection

    400/230V,20kw

    Weight

    55kg

    Flow controller

    Mass flow controller

    Max Past size

    100mm dia.(4’’)

     

    Features

    1. Excellent temperature uniformity up to 4 gas lines

    2. Heated by 2×24 IR infrared Lamps

    3. Flow controller for 5nlmvacuum