HTTF-1200 Mist CVD Furnace is a 1200 C tube furnace integrated with an ultrasonic mist system for epitaxial thin film or single crystal growth via the mist CVD method. CVD Chemical Vapor Deposition furnace is a process which allows the creation of a deposit on the surface of mechanical parts, to protect them from oxidation and corrosion, and widely used as high temperature laboratory furnace.
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HTTF-1200 Mist CVD Furnace is a 1200 C tube furnace integrated with an ultrasonic mist system for epitaxial thin film or single crystal growth via the mist CVD method. CVD Chemical Vapor Deposition furnace is a process which allows the creation of a deposit on the surface of mechanical parts, to protect them from oxidation and corrosion, and widely used as high temperature laboratory furnace.
Furnace | The splittable tube furnace with 1200 C Max. working temperature 400 mm length heating zone with 125 mm length constant temperature zone. 30 segments programmable temperature controller with +/- 1ºC accuracy Power: 3KW, 220VAC ( +/- 10% ）， single phase， 50/60Hz Click the picture left to see detailed specs Note: working temperature can be upgraded to 1500 C by HTTF-1500 |
Quartz Tube & Sample Holder | A quartz processing tube with flanges and the size of OD 60 mm x ID 54 mm x L 1000 mm is included One quartz sample holder is included, which can hold 4 pcs of 10x10x0.5 mm substrate at 45 degrees. Click Picture left to order spare |
Ultrasonic Mist Generator | 1.7 Mhz ultrasonic generator is located in an airtight SS316 tank. 4 levels of ultrasonic power are for adjusting the mist amount Mist time is 30 - 180 minutes adjustable A liquid syringe pump is equipped to inject automatically which comes with a 60 ml plastic syringe. The speed range for the liquid injection pump is 0.004 ml/min - 70 ml/min The mist generator is connected to a tube furnace via a 1/4" stainless steel tube |
MFC Gas Delivery System | 4 channels MFC gas mixing and delivering station is included 2 channel gases are filled into stainless steel tank as carrying gas after mixing another 2 channels of gases are filled into a tube furnace as diluting gas after mixing MFC flow rate: 0 - 500 ml/ minute adjustable MFC flow accuracy: ±0.2%F.S Working pressure range: 0.1～0.5 MPa |
Vacuum Pump ( optional ) | KF 25 vacuum port is installed on the flange of the processing tube with a valve to connect to a vacuum pump A dry pump is strongly recommended for the longer service life of Mist CVD. Please click the picture left to order a pump if you need |
Control Panel | Touch screen control panel to set operation parameters, including Temperature program and curve 4 channels gas flow rate Mist-generating level and time RS 485 port and PC operation software is available upon request |
Dimensions | TBD |
Net Weight | TBD |
Warranty | One-year limited warranty with lifetime support (Consumable parts such as processing tubes and O-rings are not covered by the warranty, please order the replacement at related products below.) |
Application | This kind of mist CVD can be used to grow Ga2O3 crystal with high quality |
HTTF-1200 Mist CVD Furnace is a 1200 C tube furnace integrated with an ultrasonic mist system for epitaxial thin film or single crystal growth via the mist CVD method. CVD Chemical Vapor Deposition furnace is a process which allows the creation of a deposit on the surface of mechanical parts, to protect them from oxidation and corrosion, and widely used as high temperature laboratory furnace.
Furnace | The splittable tube furnace with 1200 C Max. working temperature 400 mm length heating zone with 125 mm length constant temperature zone. 30 segments programmable temperature controller with +/- 1ºC accuracy Power: 3KW, 220VAC ( +/- 10% ）， single phase， 50/60Hz Click the picture left to see detailed specs Note: working temperature can be upgraded to 1500 C by HTTF-1500 |
Quartz Tube & Sample Holder | A quartz processing tube with flanges and the size of OD 60 mm x ID 54 mm x L 1000 mm is included One quartz sample holder is included, which can hold 4 pcs of 10x10x0.5 mm substrate at 45 degrees. Click Picture left to order spare |
Ultrasonic Mist Generator | 1.7 Mhz ultrasonic generator is located in an airtight SS316 tank. 4 levels of ultrasonic power are for adjusting the mist amount Mist time is 30 - 180 minutes adjustable A liquid syringe pump is equipped to inject automatically which comes with a 60 ml plastic syringe. The speed range for the liquid injection pump is 0.004 ml/min - 70 ml/min The mist generator is connected to a tube furnace via a 1/4" stainless steel tube |
MFC Gas Delivery System | 4 channels MFC gas mixing and delivering station is included 2 channel gases are filled into stainless steel tank as carrying gas after mixing another 2 channels of gases are filled into a tube furnace as diluting gas after mixing MFC flow rate: 0 - 500 ml/ minute adjustable MFC flow accuracy: ±0.2%F.S Working pressure range: 0.1～0.5 MPa |
Vacuum Pump ( optional ) | KF 25 vacuum port is installed on the flange of the processing tube with a valve to connect to a vacuum pump A dry pump is strongly recommended for the longer service life of Mist CVD. Please click the picture left to order a pump if you need |
Control Panel | Touch screen control panel to set operation parameters, including Temperature program and curve 4 channels gas flow rate Mist-generating level and time RS 485 port and PC operation software is available upon request |
Dimensions | TBD |
Net Weight | TBD |
Warranty | One-year limited warranty with lifetime support (Consumable parts such as processing tubes and O-rings are not covered by the warranty, please order the replacement at related products below.) |
Application | This kind of mist CVD can be used to grow Ga2O3 crystal with high quality |
