HTTF-1200-NW laboratory furnace is a compact 1100°C CVD tube furnace with a precursor sublimating attachment. Totally four-channel gas inlets are built on the sublimation which allows feedings of various gases to carry the source vapor into the main heater for further decomposition and deposition.
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HTTF-1200-NW laboratory furnace is a compact 1100°C CVD tube furnace with a precursor sublimating attachment. Totally four-channel gas inlets are built on the sublimation which allows feedings of various gases to carry the source vapor into the main heater for further decomposition and deposition. The sample holder fixture mounted on the right flange is slidable for easy sample loading/unloading. Such a system configuration is suitable for growing a wide range of transitional metal dichalcogenides (TMD) such as MoSe2, MoS2. and wide bandgap semiconductors (such as h-BN) layers on substrate up to 3" diameter.
Furnace and Preheater | Compact CVD furnace system with: OD 110 xID 103 x L 740, mm Length quartz tube 1100ºC Max. working temperature with +/- 1oC accuracy The water cooling flange on the right side is slidable for easy sample loading The water cooling flange on the left side between the heater and furnace is used for pre-heated gas input and sealing Four-channel gas inlet (1/8" Dia tube and tube fitting) are built-in on the left side flange One small heater is attached to the left side flange of the furnace to preheat input gas, liquid, or evaporate solid chemical, which will be then delivered to the CVD furnace: Please click the picture left for more details: 1.2''O.D x 6''L SS tube as the heating chamber Vacuum sealed 1" ID small quartz tube inside the heater 400ºC Max. working temperature (1000ºC heater is available upon request) The flange on the left side is for gas sealing and input |
Rated Voltage | Single Phase, 208-240 VAC, 50/60 Hz, AWG 8# Power cord is included (without plug) |
Power consumption | Max. 3600 W (20 A breaker required) |
Heating Zone | CVD Furnace: 440 mm Constant temperature zone: 100 mm Gas Heater: 150mm |
Working Temperature | CVD Furnace: Max heating temperature: 1100°C (< 2 hour) Continuous working temperature: 200~1000°C Max heating & cooling rate: 20°C/min Heater: Continuous working temperature: RT~600°C Max heating & cooling rate: 20°C/min |
Temperature Control | CVD Furnace and Heater (separate temp control): Digital controllers with PID/self-tuning functions and 30 segments programmable Thermocouple: K-type thermocouples, at the right side flange through feedthrough to control furnace temperature. Control accuracy: +/- 1°C RS485 Communications Port |
Vacuum and Gas Sealing & Flange | The right flange of the CVD furnace Water cooling flanges to prevent sealing o-ring from melting KF25 vacuum port to a pump Slidable for the customer to easily and fast push/pull in/out a sample One quartz wafer holder (3" Dia) is included and the flange with heating radiation block An anti-corrosive capacitance diaphragm gauge is included Left flange (between CVD Furnace and Heater) with four 1/8'' Swagelok fittings for 1/8'' tube: Two 1/8'' fitting on the flange for independently and directly delivering any gas into the CVD furnace One 1/8'' fitting for delivering heated gas from heater to CVD furnace One 1/4'' fitting for bypassing the gas (without heating) to the CVD furnace (inside the CVD furnace, the gas tube is merged with the heated gas pipe by a T fitting) Note: How gas pipe assembled in the CVD furnace through above 1/8'' fitting: One 1/4'' quartz tube delivers the vapor gas from the heater (also the bypass gas by a T fitting) Two 1/4'' quartz tube delivery extra gas via the two separate 1/8'' fitting on the big furnace left the flange These three 1/4'' quartz tubes inside the CVD furnace are in parallel and vertically 1'' higher than the sample holder These three 1/4'' quartz tubes can be easily removed to clean or replaced once get stuck or corroded |
The optional Liquid Injection device-optional | For direct liquid CVD ( DLCVD), you may consider the below devices for liquid injection: |
Net weight | 110kg |
Dimensions | Standard: 62"L X 18"W X 23"H Maximum: 80"L X 18"W X 32"H (Lid open and right-side flange slide out) |
Shipping Weight & Dimensions | 380 lbs 48"x40"x54" |
Warranty | One-year limited warranty for electrical parts. (Consumable parts such as processing tubes, o-rings and etc are not covered by the warranty) You may order a replacement quartz tube here: |
Laptop, software & WiFi Control (Optional) | Brand new laptop with Microsoft Windows 10 Labview Based Temperature Control System enables the user to edit temperature profiles, manage heat-treatment recipes, record, and plot data for MTI furnaces. A wireless remote control provides up to 300 meters of operating range. Eurotherm temperature controller with software is available upon request at extra cost, which can provide +/- 0.1oC accuracy. ( see product options bar) |
Warning | The tube furnaces with quartz tubes are designed for use under vacuum and low pressure <0.2 bars (relative to 1 atm, absolute pressure = 1.2 bar if used in air) Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Vacuum pressures may only be safely used up to 1000°C |
CVD Chemical Vapor Deposition furnaces is a process which allows the creation of a deposit on the surface of mechanical parts, to protect them from oxidation and corrosion.
HTTF-1200-NW laboratory furnace is a compact 1100°C CVD tube furnace with a precursor sublimating attachment. Totally four-channel gas inlets are built on the sublimation which allows feedings of various gases to carry the source vapor into the main heater for further decomposition and deposition. The sample holder fixture mounted on the right flange is slidable for easy sample loading/unloading. Such a system configuration is suitable for growing a wide range of transitional metal dichalcogenides (TMD) such as MoSe2, MoS2. and wide bandgap semiconductors (such as h-BN) layers on substrate up to 3" diameter.
Furnace and Preheater | Compact CVD furnace system with: OD 110 xID 103 x L 740, mm Length quartz tube 1100ºC Max. working temperature with +/- 1oC accuracy The water cooling flange on the right side is slidable for easy sample loading The water cooling flange on the left side between the heater and furnace is used for pre-heated gas input and sealing Four-channel gas inlet (1/8" Dia tube and tube fitting) are built-in on the left side flange One small heater is attached to the left side flange of the furnace to preheat input gas, liquid, or evaporate solid chemical, which will be then delivered to the CVD furnace: Please click the picture left for more details: 1.2''O.D x 6''L SS tube as the heating chamber Vacuum sealed 1" ID small quartz tube inside the heater 400ºC Max. working temperature (1000ºC heater is available upon request) The flange on the left side is for gas sealing and input |
Rated Voltage | Single Phase, 208-240 VAC, 50/60 Hz, AWG 8# Power cord is included (without plug) |
Power consumption | Max. 3600 W (20 A breaker required) |
Heating Zone | CVD Furnace: 440 mm Constant temperature zone: 100 mm Gas Heater: 150mm |
Working Temperature | CVD Furnace: Max heating temperature: 1100°C (< 2 hour) Continuous working temperature: 200~1000°C Max heating & cooling rate: 20°C/min Heater: Continuous working temperature: RT~600°C Max heating & cooling rate: 20°C/min |
Temperature Control | CVD Furnace and Heater (separate temp control): Digital controllers with PID/self-tuning functions and 30 segments programmable Thermocouple: K-type thermocouples, at the right side flange through feedthrough to control furnace temperature. Control accuracy: +/- 1°C RS485 Communications Port |
Vacuum and Gas Sealing & Flange | The right flange of the CVD furnace Water cooling flanges to prevent sealing o-ring from melting KF25 vacuum port to a pump Slidable for the customer to easily and fast push/pull in/out a sample One quartz wafer holder (3" Dia) is included and the flange with heating radiation block An anti-corrosive capacitance diaphragm gauge is included Left flange (between CVD Furnace and Heater) with four 1/8'' Swagelok fittings for 1/8'' tube: Two 1/8'' fitting on the flange for independently and directly delivering any gas into the CVD furnace One 1/8'' fitting for delivering heated gas from heater to CVD furnace One 1/4'' fitting for bypassing the gas (without heating) to the CVD furnace (inside the CVD furnace, the gas tube is merged with the heated gas pipe by a T fitting) Note: How gas pipe assembled in the CVD furnace through above 1/8'' fitting: One 1/4'' quartz tube delivers the vapor gas from the heater (also the bypass gas by a T fitting) Two 1/4'' quartz tube delivery extra gas via the two separate 1/8'' fitting on the big furnace left the flange These three 1/4'' quartz tubes inside the CVD furnace are in parallel and vertically 1'' higher than the sample holder These three 1/4'' quartz tubes can be easily removed to clean or replaced once get stuck or corroded |
The optional Liquid Injection device-optional | For direct liquid CVD ( DLCVD), you may consider the below devices for liquid injection: |
Net weight | 110kg |
Dimensions | Standard: 62"L X 18"W X 23"H Maximum: 80"L X 18"W X 32"H (Lid open and right-side flange slide out) |
Shipping Weight & Dimensions | 380 lbs 48"x40"x54" |
Warranty | One-year limited warranty for electrical parts. (Consumable parts such as processing tubes, o-rings and etc are not covered by the warranty) You may order a replacement quartz tube here: |
Laptop, software & WiFi Control (Optional) | Brand new laptop with Microsoft Windows 10 Labview Based Temperature Control System enables the user to edit temperature profiles, manage heat-treatment recipes, record, and plot data for MTI furnaces. A wireless remote control provides up to 300 meters of operating range. Eurotherm temperature controller with software is available upon request at extra cost, which can provide +/- 0.1oC accuracy. ( see product options bar) |
Warning | The tube furnaces with quartz tubes are designed for use under vacuum and low pressure <0.2 bars (relative to 1 atm, absolute pressure = 1.2 bar if used in air) Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Vacuum pressures may only be safely used up to 1000°C |
CVD Chemical Vapor Deposition furnaces is a process which allows the creation of a deposit on the surface of mechanical parts, to protect them from oxidation and corrosion.
