HTCGF-2000-CZ Crystal Grower System is a small-scale Czochralski CZ Crystal Growth Furnace for metals and oxides with a diameter < 1". It has been proven excellent for pulling various crystals with up to 2100 deg C, IMCS-2000-CZ including Al2O3, GGG, YAG, LaAlO3, Si, Ge, etc.
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HTCGF-2000-CZ Crystal Grower System is a small-scale Czochralski CZ Crystal Growth Furnace for metals and oxides with a diameter < 1". It has been proven excellent for pulling various crystals with up to 2100 deg C, IMCS-2000-CZ including Al2O3, GGG, YAG, LaAlO3, Si, Ge, etc. HT provides technical training on installing and operating before shipping, also provides online video technical support worldwide.
Power | Input: 208VAC or 380VAC, 3 phase, 50A (max induction power), 50/60Hz Output: 25kW(max) |
Heating and Temperature | Max: 2100°C (3812°F) with induction heating |
Vacuum Chamber | Material: SS304 Size: Φ320×320mm, equipped with a quartz window (Φ120mm) to observe material melting, crystal seeding, and growth. There is one KF25 port and one KF40 vacuum port connected to the back of the chamber. There is also one LF160 port on the right side of the chamber for molecular pump system connecting. |
Pulling Mechanism | The pulling mechanism is driven by a precision servo motor/n Pulling Speed: 0.1-10 mm/hr Pulling rod rotation speed: 0.1-23 rpm Travel Distance: 0-300mm The pulling mechanism can move as quickly as 35mm/min |
Vacuum atmosphere | The vacuum chamber can be evacuated and filled with inert gases. Equipped with a digital anti-corrosion vacuum gauge (oiled ceramic coating on the sensor), the measuring range is 10 ^-5 ~ 1000torr Vacuum level: 5x 10-5 torr (turbopump) or 5 × 10-2 Torr (mechanical pump) |
Induction Heating | 25KW (30-80KHz) induction power supply with Time Controller and Power Controller Induction coil: φ90mm × 80mmH Water cooling: 116L/min circulating water chiller is included Please note, the standard configuration does not contain a temperature control system, optional temperature control system, to control the melting temperature. The crucible and thermal insulation accessories are not included. We can provide them based on your application. |
Control Panel | Touch screen control panel control Induction power / pulling speed / rotating speed |
Application Notes of Czochralski Crystal Growth Furnace system.
Melting materials
Crystal seeding
Start pulling
Sapphire boule grown
Ni Crystal grown
Stability provides the crystal grower with a known and constant environment for demanding crystal growth. Stability assures uniform, tightly defined temperatures and thermal gradients for consistent melts and zone refining. Stability requires well-controlled gaseous or vacuum environments. Stability in crystal growth demands smooth, highly constant, vibration-free motions with large and dynamic ranges, programmable first and second derivatives and multi-axis configurations – yet all must be controlled.
HTCGF-2000-CZ Crystal Grower System is a small-scale Czochralski CZ Crystal Growth Furnace for metals and oxides with a diameter < 1". It has been proven excellent for pulling various crystals with up to 2100 deg C, IMCS-2000-CZ including Al2O3, GGG, YAG, LaAlO3, Si, Ge, etc. HT provides technical training on installing and operating before shipping, also provides online video technical support worldwide.
Power | Input: 208VAC or 380VAC, 3 phase, 50A (max induction power), 50/60Hz Output: 25kW(max) |
Heating and Temperature | Max: 2100°C (3812°F) with induction heating |
Vacuum Chamber | Material: SS304 Size: Φ320×320mm, equipped with a quartz window (Φ120mm) to observe material melting, crystal seeding, and growth. There is one KF25 port and one KF40 vacuum port connected to the back of the chamber. There is also one LF160 port on the right side of the chamber for molecular pump system connecting. |
Pulling Mechanism | The pulling mechanism is driven by a precision servo motor/n Pulling Speed: 0.1-10 mm/hr Pulling rod rotation speed: 0.1-23 rpm Travel Distance: 0-300mm The pulling mechanism can move as quickly as 35mm/min |
Vacuum atmosphere | The vacuum chamber can be evacuated and filled with inert gases. Equipped with a digital anti-corrosion vacuum gauge (oiled ceramic coating on the sensor), the measuring range is 10 ^-5 ~ 1000torr Vacuum level: 5x 10-5 torr (turbopump) or 5 × 10-2 Torr (mechanical pump) |
Induction Heating | 25KW (30-80KHz) induction power supply with Time Controller and Power Controller Induction coil: φ90mm × 80mmH Water cooling: 116L/min circulating water chiller is included Please note, the standard configuration does not contain a temperature control system, optional temperature control system, to control the melting temperature. The crucible and thermal insulation accessories are not included. We can provide them based on your application. |
Control Panel | Touch screen control panel control Induction power / pulling speed / rotating speed |
Application Notes of Czochralski Crystal Growth Furnace system.
Melting materials
Crystal seeding
Start pulling
Sapphire boule grown
Ni Crystal grown
Stability provides the crystal grower with a known and constant environment for demanding crystal growth. Stability assures uniform, tightly defined temperatures and thermal gradients for consistent melts and zone refining. Stability requires well-controlled gaseous or vacuum environments. Stability in crystal growth demands smooth, highly constant, vibration-free motions with large and dynamic ranges, programmable first and second derivatives and multi-axis configurations – yet all must be controlled.
