Semiconductor Diffusion furnace is a thermal processing unit with a cylindrical heating chamber that can be oriented either horizontally or vertically. This enables circular work pieces to be processed with outstanding thermal uniformity due to the equidistant surfaces radiating heat.
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Semiconductor Diffusion furnace is a thermal processing unit with a cylindrical heating chamber that can be oriented either horizontally or vertically. This enables circular work pieces to be processed with outstanding thermal uniformity due to the equidistant surfaces radiating heat. They can also function under partial vacuum conditions to ensure tight atmospheric control throughout operation. This is critical in ensuring optimal conditions for the vapor-phase to diffuse into the solid state semiconductor without introducing undesirable impurities.
Semiconductor Diffusion Furnace
STASDF 150: 4-stack furnace system for wafers up to 150mm dia.
STASDF 200: 4-stack furnace system for wafers up to 200mm dia.
STASDF 250: 3-stack furnace system for wafers up to 250mm dia.
STASDF 300: 3-stack furnace system for wafers up to 300mm dia.
Custom configurations available for horizontal diffusion furnace for semiconductor
Compact only 4.2 m² (45.9 ft²) in clean room
Each tube level microprocessor controlled for functional capability and ease of operation
Windows® based operating system for ease of use
Host computer with flat screen and keyboard/mouse controls (touch-screen available).
Available with atmospheric, LPCVD and PECVD processing capability
Film uniformities on many processes comparable with vertical furnaces at less than 1/3 the cost
Semiconductor Diffusion Furnace Systems are Fully Equipped
Our horizontal diffusion furnace systems are complete, compact and can be configured to your specific requirements
STA some horizontal tube furnace is also as diffusion furnace after improvement for semiconductor. This simple tube furnace can save more production cost.
Semiconductor Diffusion furnace is a thermal processing unit with a cylindrical heating chamber that can be oriented either horizontally or vertically. This enables circular work pieces to be processed with outstanding thermal uniformity due to the equidistant surfaces radiating heat. They can also function under partial vacuum conditions to ensure tight atmospheric control throughout operation. This is critical in ensuring optimal conditions for the vapor-phase to diffuse into the solid state semiconductor without introducing undesirable impurities.
Semiconductor Diffusion Furnace
STASDF 150: 4-stack furnace system for wafers up to 150mm dia.
STASDF 200: 4-stack furnace system for wafers up to 200mm dia.
STASDF 250: 3-stack furnace system for wafers up to 250mm dia.
STASDF 300: 3-stack furnace system for wafers up to 300mm dia.
Custom configurations available for horizontal diffusion furnace for semiconductor
Compact only 4.2 m² (45.9 ft²) in clean room
Each tube level microprocessor controlled for functional capability and ease of operation
Windows® based operating system for ease of use
Host computer with flat screen and keyboard/mouse controls (touch-screen available).
Available with atmospheric, LPCVD and PECVD processing capability
Film uniformities on many processes comparable with vertical furnaces at less than 1/3 the cost
Semiconductor Diffusion Furnace Systems are Fully Equipped
Our horizontal diffusion furnace systems are complete, compact and can be configured to your specific requirements
STA some horizontal tube furnace is also as diffusion furnace after improvement for semiconductor. This simple tube furnace can save more production cost.
